Uncertainty of Cutting Edge Roughness Estimation Depending on Waviness Filtration
نویسندگان
چکیده
منابع مشابه
Impact of Mask Roughness on Wafer Line-Edge Roughness
The influence of line-edge roughness (LER) of an optical photomask on the resulting printed wafer LER is investigated. The LER Transfer function (LTF) proposed by Naulleau and Gallatin, and later corrected by Tanabe, is shown to be a very useful tool for evaluating the low-pass filtering behavior of the imaging tool and its impact on the transfer of mask LER to the wafer. Highfrequency mask LER...
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ژورنال
عنوان ژورنال: Procedia CIRP
سال: 2016
ISSN: 2212-8271
DOI: 10.1016/j.procir.2016.02.050